SAN JOSE, Calif. – March 1, 2010 - Apache Design Solutions, the technology leader in power integrity and noise closure for chip-package-systems (CPS) convergence, today announced that Totem-SE, the industry’s first fully integrated power and noise analysis platform for analog, mixed-signal, memory, and high-speed I/O designs, has been selected from hundreds of nominations to be [...]
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SiPArray™ integrated passives technology combined with HiPer Silicon™ software provides breakthrough for complete A/MS IC design solution
MONROVIA, California and BURLINGTON, Ontario, Canada — February 16, 2010 – Tanner EDA, the catalyst for innovation for the design, layout and verification of analog and mixed-signal integrated circuits (ICs) and Sound Design Technologies (SDT), a leading designer and [...]
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RedHawk and PakSi-E deployed as the power analysis, sign-off, and optimization solutions for leading network storage designs
SAN JOSE, CALIFORNIA – February 9, 2010 – Apache Design Solutions, the technology leader in power and noise integrity for chip-package-systems (CPS) convergence, today announced that PLX Technology, Inc. (NASDAQ: PLXT) has adopted Apache’s RedHawk-NX and PakSi-E solutions to [...]
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Berkeley Design Automation Inc., provider of the Analog FastSPICE™ unified circuit verification platform for advanced analog and RF integrated circuits (ICs), today announced that ST-Ericsson, a world leader in mobile platforms and wireless semiconductor solutions has selected the Analog FastSPICE™ Platform.
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Concept Engineering today announced that Oasys Design Systems, Inc., developer of the RealTime Designer full-chip physical register transfer-level (RTL) synthesis product, has signed a worldwide OEM license for Concept Engineering′s Nlview™ visualization engine
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Solido Design Automation, a leading developer of software for eliminating design loss caused by process variation in analog/mixed-signal and custom integrated circuits, today announced the availability of a new application for its Variation Designer solution that analyzes and solves well proximity effect problems that become major concerns at 90 nm and below.
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