imaging

This tag is associated with 3 posts

Tanner EDA Expands Presence in Southeast Asia

Advinno to provide sales and support for full-flow analog IC design tool suite MONROVIA, California – May 19, 2010 – Tanner EDA, the catalyst for innovation for the design, layout and verification of analog and mixed-signal integrated circuits (ICs) has appointed Advinno Technologies Pte. Ltd. of Singapore to provide regional representation in Southeast Asia. Advinno [...]
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Tanner EDA and Dongbu HiTek Semiconductor Jointly Develop Foundry-certified Process Design Kits (PDKs) for Critical Process Nodes

Leaders in A/MS design innovation to deliver certified libraries, integrated flow MONROVIA, California and SEOUL, Korea – March 24, 2010 – Tanner EDA, the catalyst for innovation for the design, layout and verification of analog and mixed-signal (A/MS) integrated circuits (ICs) and Dongbu HiTek, a world-class wafer fabricator, are jointly developing foundry-certified process development kits [...]
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Tanner EDA and IC Mask Design Collaborate on Tools to Accelerate Analog Layout Design

Tanner EDA layout expertise and IC Mask Design’s layout technology to boost design productivity and quality MONROVIA, California – March 2, 2010 – Tanner EDA, the catalyst for innovation for the design, layout and verification of analog and mixed-signal integrated circuits (ICs) and IC Mask Design, an industry leader in the provision of physical design [...]
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