A/MS
Tanner EDA and Dongbu HiTek Semiconductor Jointly Develop Foundry-certified Process Design Kits (PDKs) for Critical Process Nodes
Leaders in A/MS design innovation to deliver certified libraries, integrated flow MONROVIA, California and SEOUL, Korea – March 24, 2010 – Tanner EDA, the catalyst for innovation for the design, layout and verification of analog and mixed-signal (A/MS) integrated circuits (ICs) and Dongbu HiTek, a world-class wafer fabricator, are jointly developing foundry-certified process development kits [...]Read More
Tanner EDA to Exhibit at DesignCon: Software Solutions to Catalyze Innovation in Design, Layout and Verification of A/MS ICs
MONROVIA, Calif.. – January 26, 2010 – Tanner EDA, the catalyst for innovation for the design, layout and verification of analog and mixed-signal integrated circuits (ICs), will be exhibiting a complete line of software solutions for analog/ mixed-signal (A/MS) designers on February 2nd to 3rd in the Santa Clara Convention Center. What: Tanner EDA’s product [...]Read More
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